کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5359025 | 1503675 | 2014 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Electrical properties of SiGe nanowire following fluorine/nitrogen plasma treatment
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موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The improvements to electrical properties of SiGe nanowires by surface plasma treatment were investigated. Various durations of pre-oxidation with fluorine; ambients for post-nitridation plasma treatment, and annealing temperature after plasma treatment, 800-950 °C, were applied. Pre-oxidation treatment using fluorine plasma; improved the conductance of SiGe nanowires because the Si-F binding energy created a more stable interface state than bare nanowire on the surface of SiGe. N2 plasma incorporated more N than does in NH3 plasma, and NH3 has the drawback of introducing electron traps, causing Si-H bonds to break in the subsequent annealing process. Since the reparation of surface defects by plasma treatment is valid, the high post-annealing temperature to reduce defect by re-crystallizing can be reduced. Hence, Ge diffusion at low post-annealing temperature did not reduce the high concentration of Ge at the SiGe nanowire surfaces.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 289, 15 January 2014, Pages 581-585
Journal: Applied Surface Science - Volume 289, 15 January 2014, Pages 581-585
نویسندگان
Kow-Ming Chang, Chu-Feng Chen, Chiung-Hui Lai, Po-Shen Kuo, Yi-Ming Chen, Tai-Yuan Chang,