کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5359262 1388245 2011 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Boron doped ZnO thin films fabricated by RF-magnetron sputtering
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Boron doped ZnO thin films fabricated by RF-magnetron sputtering
چکیده انگلیسی
▶ Both as-deposited and annealed ZnO:B films exhibit much lower resistivity as well as slightly broader optical band gap compared with pure ZnO film. ▶ These results are consistent with the first-principles calculations that in both ZnO:B films not only the band gap becomes narrower but also the Fermi level shifts up into the conduction band with respect to the pure ZnO film.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 257, Issue 7, 15 January 2011, Pages 2498-2502
نویسندگان
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