Ti/TiN multilayer thin films deposited by pulse biased arc ion plating

▶ Ti/TiN multilayer films were successfully deposited by pulse biased arc ion plating. ▶ The highest hardness value reached 43 GPa for the modulation period of 54 nm. ▶ A good adhesion of the deposited films is achieved with a maximum adhesion of 83 N. ▶ Such superhard multilayer films would be favorable for application in the future.