کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5359420 | 1503677 | 2013 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Fabrication and characterization of P-N dual acceptor doped p-type ZnO thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
P and N dual-acceptor doped p-type zinc oxide (ZnO:(P, N)) films have been realized by radio frequency (rf) magnetron sputtering and post-annealing techniques. The X-ray diffraction (XRD), secondary ion mass spectrometry (SIMS), X-ray photoelectron spectroscopy (XPS) and the Hall measurement techniques were employed to investigate the structural and the electrical properties in detail. Results indicated the electrical properties of the ZnO:(P, N) films were extremely sensitive to the annealing temperature and the conduction type could be changed dramatically from n-type to p-type, and finally changed to weak p-type in a range from 650 °C to 850 °C. The p-type ZnO:(P, N) film with the lower resistivity of 3.98 Ω cm, a hole concentration and Hall mobility of 1.16 Ã 1018 cmâ3 and 1.35 cm2/Vs, respectively, was obtained at an optimal annealing temperature of 800 °C. The p-type conduction behavior of the ZnO:(P, N) film was confirmed by the rectifying I-V characteristics of the p-ZnO:(P, N)/n-ZnO homojunction. The chemical bonding states of P and N doped in ZnO:(P, N) film were examined by XPS analysis.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 287, 15 December 2013, Pages 484-489
Journal: Applied Surface Science - Volume 287, 15 December 2013, Pages 484-489
نویسندگان
Y.R. Sui, B. Yao, L. Xiao, L.L. Yang, J. Cao, X.F. Li, G.Z. Xing, J.H. Lang, X.Y. Li, S.Q. Lv, X.W. Meng, X.Y. Liu, J.H. Yang,