Grid-pattern formation of extracellular matrix on silicon by low-temperature atmospheric-pressure plasma jets for neural network biochip fabrication

► A new technique to form microscopic grid patterns of the ECM on a Si surface is presented. ► The technique uses cold atmospheric pressure plasmas with a metal stencil mask. ► Reactive oxygen species in the cold plasma are likely to remove exposed ECM. ► Neuronal model cells PC12 are shown to proliferate on patterned ECM grid layers on Si although neuronal network formation on patterned ECM is yet to be studied. ► Plasma overexposure can form ECM grid patterns narrower than the mask patterns.