کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5360201 1388257 2009 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Dose and pressure dependence of silicon microstructure in SF6 gas due to excimer laser irradiation
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Dose and pressure dependence of silicon microstructure in SF6 gas due to excimer laser irradiation
چکیده انگلیسی
ArF excimer laser radiation on Si surface at controlled SF6 atmosphere creates a microstructure whose alteration at various UV doses and SF6 pressures are investigated in this work. Moreover, a rigorous model has been presented here regarding the experiments based on the micro-fluid mechanical properties of molten silicon layer and the subsequent mechanical wave resonance due to the surface shallow fluid theory. The competitive thermal and non-thermal UV laser interaction with Si and the following heat transfer explains the creation of the self-assembled micro-pillars on Si surface.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 255, Issue 8, 1 February 2009, Pages 4664-4669
نویسندگان
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