Migration of indium ions in amorphous indium-gallium-zinc-oxide thin film transistors

Electromigration of In in amorphous indium-gallium-zinc-oxide thin film transistors under repeated switching operation was investigated by analyzing the distribution of component elements. During the repeated switching operations up to 300 times, threshold voltage of this device increased gradually implying alteration to the internal device structures. Energy dispersive X-ray spectroscopy revealed noticeable redistribution of metallic components, especially In, in the channel layer beneath the source electrode during switching operations by the migration of metallic ions away from the source electrode, which is attributed to electromigrations similar to those observed in organic light emitting diodes having indium tin oxide electrodes.

► Migration of In was observed in indium-gallium-zinc-oxide thin film transistors. ► In migration accompanied performance degradation in terms of threshold voltage shift. ► Momentum transfer by injected electrons as suggested as possible mechanism.