Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering

► The relationship between structure and properties of CrAlN film is investigated. ► The microstructure of the CrAlN is analyzed in detail as a function of the bias voltage. ► The mechanism of the evolution of the mechanical properties is expounded. ► The CrAlN film shows excellent wear resistance and low friction coefficient at −100 V. ► The corrosion resistance is influenced by Al content and structure of the film.