Ultra-fast photo-patterning of hydroxamic acid layers adsorbed on TiAlN: The challenge of modeling thermally induced desorption

► Different hydroxamic acids are suitable for the hydrophobization of TiAlN surfaces used in photo-patterning applications. ► The binding strength of the surfactant on the surface is dependent on the hydrogen and π-bonding interactions within the organic layer. ► Thermal desorption of selected HA species results in a 20% energy reduction compared to alkyl phosphates.