Reactive sputtering of ZnO:Al thin films from rotatable dual metallic targets

► ZnO:Al films are prepared by reactively sputtering from rotatable dual metallic targets. ► High rate ZnO:Al films with good electrical and optical properties as well as proper surface structures are achieved at the transition mode region. ► Different working points or PEM intensities lead to different deposition rates, which are related with oxygen partial pressure as well as the sputtering properties to oxide and metal materials. ► The oxygen partial pressure plays a important role on different properties of reactively sputtered ZnO:Al films.