Layer-by-layer deposition of Ti-4,4′-oxydianiline hybrid thin films

► A novel inorganic-organic hybrid material of the (-Ti-N-C6H4-O-C6H4-N-)n type is reported. ► The new hybrid material is grown layer-by-layer with an ALD-type process. ► Hybrid films deposited at 250-490 °C are stable in atmospheric conditions. ► Films grown at higher temperatures are more stable than those grown at lower temperatures. ► The growth rate increases with increasing temperature.