A chemical kinetic model for chemical vapor deposition of carbon nanotubes

► We studied the dependence of the deposition parameters on the controllable parameters for CNTs during CVD process. ► The deposition temperature and the deposition pressure show a decreasing trend with an increase of furnace temperature upto 1000 K. ► The deposition temperature decreases with reaction time. The deposition pressure is found to remain constant at the initial stage, and then decrease as time progresses. ► All deposition parameters show a decreasing trend with increase of volumetric flow rate. ► An experimental study was also conducted and the results were found to agree well with the theoretical predictions obtained.