Effect of sputtering power on the properties of ZnO:Ga transparent conductive oxide films deposited by pulsed DC magnetron sputtering with a rotating cylindrical target

► GZO films by p-DCMS with a cylindrical target were prepared at different powers. ► The film deposited at 2.0 kW showed the lowest resistivity and highest mobility. ► All films fulfilled the requirements for TCO regardless of the sputtering power.