کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5363290 | 1388299 | 2010 | 7 صفحه PDF | دانلود رایگان |
TixSi1âxO2 compound thin-film systems were deposited by reactive RF magnetron co-sputtering technique. The effect of Ti concentration on the hydrophilicity of TixSi1âxO2 compound thin films was studied and it was shown that the films with Ti0.6Si0.4O2 composition possess the best hydrophilic property among all the grown samples. Surface ratio and average roughness of the thin films were measured by atomic force microscopy (AFM). Surface chemical states and stoichiometry of the films were determined by X-ray photoelectron spectroscopy (XPS). In addition, XPS revealed that the amount of Ti-O-Si bonds in nanometer depth from the surface of the Ti0.6Si0.4O2 films was the maximum, which resulted in the most stable superhydrophilic property. According to XRD data analysis for the pure TiO2 films, the polycrystalline anatase phase was formed with an average grain size of about 15Â nm. Moreover, amorphous phase was also formed for the TixSi1âxO2 compound systems due to presence of silicon in the films. Finally, optical properties of the films such as transmission, reflection and band gap energy were investigated using UV-vis spectrophotometry. It was found that the transmittance of the films was decreased with increasing Ti concentration in the films.
Journal: Applied Surface Science - Volume 256, Issue 8, 1 February 2010, Pages 2500-2506