Solvent vapor induced morphology transition in thin film of cylinder forming diblock copolymer

The morphology formation and transition of thin film of a cylinder-forming polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer annealed under 1,1,2-trichloroethane (Tri-CE), toluene (Tol), and their binary mixed solvent vapors is investigated by using optical microscopy (OM) and transmission electronic microscopy (TEM). By modulating the annealing solvent vapor pressure and the preferential affinities, a detailed morphology evolution with increasing the vapor pressure and a series of morphologies depending on the preferential affinities have been observed. A phase diagram by plotting the morphologies as a function of the annealing solvent vapor pressure and its preferential affinity is subsequently constructed.

The morphology formation and transition of thin film of polystyrene-block-poly(methyl methacrylate) diblock copolymer annealed under 1,1,2-trichloroethane, toluene, and their binary mixed solvent vapors is investigated by using OM and TEM. A morphology evolution with increasing the annealing solvent vapor pressure and a series of morphologies depending on the solvent vapor preferential affinities have been observed.