کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5364036 | 1388310 | 2007 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of swift (â¼100Â MeV) heavy ion irradiation on surface morphology and electronic transport in Fe film on Si substrate
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موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
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چکیده انگلیسی
Fe film (â¼50 nm) have been deposited on pSi substrate by electron beam evaporation technique. The bilayers have been irradiated by 100 MeV Fe7+ ions having fluences of 1 Ã 1013, 1 Ã 1014 and 5 Ã 1014 ions cmâ2. SEM study of the unirradiated devices show surface modifications having a annular structures. From XRD study of the bilayer, it is observed that grain size has reduced from 70 to 25 nm after the irradiation for a fluence of 1 Ã 1014 ions cmâ2. Moreover electronic transport data of the bilayer show practically no effect on the current flow for a fluence of 1 Ã 1013 ions cmâ2 irradiation whereas for 1 Ã 1014 ions cmâ2 fluence, there is very significant change in current flow (by two orders in magnitude) across the bilayer. However, for a higher fluence of irradiation 5 Ã 1014 ions cmâ2, the bilayer becomes highly resistive. It has been found from the above observations that the fluence of 1 Ã 1014 ions cmâ2 of swift heavy ion irradiation is a optimum fluence.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 253, Issue 21, 31 August 2007, Pages 8689-8694
Journal: Applied Surface Science - Volume 253, Issue 21, 31 August 2007, Pages 8689-8694
نویسندگان
J.K. Tripathi, P.C. Srivastava,