کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5364081 | 1388311 | 2009 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Preparation and characterization of the amorphous tungsten cone field emitter arrays by Ar+ etching
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موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Uniform amorphous tungsten cone arrays in high density were fabricated by Ar+ reduction etching of WO3 nanowire film. The etching process was performed in the analysis chamber of an X-ray photoelectron spectroscopy (XPS) system. SEM and TEM results revealed that the tip radius of the etched cones was 10Â nm, and the cones were amorphous with a high aspect ratio of over 250. XPS analysis proved the cones to be metallic tungsten. In the aspect of field-emission property, the tungsten cone arrays had a lower turn-on field of 3Â MVÂ mâ1 compared with 5Â MVÂ mâ1 of the as-grown original WO3 nanowire film.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 256, Issue 3, 15 November 2009, Pages 693-697
Journal: Applied Surface Science - Volume 256, Issue 3, 15 November 2009, Pages 693-697
نویسندگان
Fang Yan Xie, Li Gong, Xiao Liu, Jian Chen, Wei Guang Xie, Wei Hong Zhang, Shang Hui Chen,