کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5365223 | 1388327 | 2012 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
A study of high-quality freestanding diamond films grown by MPCVD
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
The fabrication process of high-quality freestanding diamond films grown by Microwave Plasma Chemical Vapor Deposition (MPCVD) was studied. Under the optimal condition, freestanding diamond films 55 mm in diameter with a thickness up to 1 mm were fabricated, showing an excellent crystalline structure as examined from Raman and X-Ray Diffraction (XRD) spectra. For most processing conditions, including substrate temperatures varied from 800 to 1050 °C, the films were found in a [1 1 1] preferential texture, whereas [2 2 0] and [0 0 1] film textures occurred in some special cases. Optical measurements of one side polished diamond films showed a cutoff wavelength 225 nm, and a transmission â¥70% at λ â¥Â 2.5 μm.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 258, Issue 16, 1 June 2012, Pages 5987-5991
Journal: Applied Surface Science - Volume 258, Issue 16, 1 June 2012, Pages 5987-5991
نویسندگان
Ming Q. Ding, Lili Li, Jinjun Feng,