کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5365452 | 1388331 | 2010 | 6 صفحه PDF | دانلود رایگان |

Different nitrogen doped amorphous carbon (CNx) films were obtained by magnetron sputtering of carbon target in argon and nitrogen atmosphere at the increasing negative bias voltages from 0 to 150Â V. The films structures have experienced great change, from the novel column to nanoporous structure at the bias voltage of 0Â V to the porous structure at 150Â V. The proposed growth process was that the CNx nuclei grew at 0Â V acted as the “seeds” for the growth of the nanocolumns, and ion etching effects at 150Â V induced the formation of nanoporous structures. Furthermore, a comparison study showed that the field emission properties of the CNx films were related with the introduction of the nitrogen atoms, the size and concentration of sp2 C clusters and the surface roughness. The films with rougher surface have lower threshold field.
Journal: Applied Surface Science - Volume 256, Issue 22, 1 September 2010, Pages 6506-6511