کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5366723 1388353 2006 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Formation of photoresist-free patterned ZnO film containing nano-sized Ag by photochemical solution deposition
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Formation of photoresist-free patterned ZnO film containing nano-sized Ag by photochemical solution deposition
چکیده انگلیسی

Direct patterning of ZnO thin film was realized without photoresist and dry etching by photochemical solution deposition. Photosensitive ortho-nitrobenzaldehyde was introduced into the solution precursors as a stabilizer and contributed to form a cross-linked network structure during photochemical reaction. Ag nanoparticles were prepared with uniform size distribution using trisodium citrate as a capping agent to incorporate into ZnO thin film in order to reduce the electrical resistance of the film. The optical and electrical properties of ZnO film with or without Ag nanoparticles after anneal at various temperatures were investigated. The reduction in transmittance with the increase in anneal temperature was observed and also the increase in the electrical resistance was found. The increase in the surface roughness of ZnO film and the decrease of surface oxygen deficiencies were mainly responsible for the decrease in transmittance and the increase in electrical resistance, respectively.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 252, Issue 21, 31 August 2006, Pages 7739-7742
نویسندگان
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