کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5367354 1388365 2011 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Thermal relaxation behavior of residual stress in laser hardened 17-4PH steel after shot peening treatment
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Thermal relaxation behavior of residual stress in laser hardened 17-4PH steel after shot peening treatment
چکیده انگلیسی

In order to investigate the residual stress relaxations of shot peened layer, isothermal annealing treatments were carried out on tempered and laser hardened 17-4PH steel after shot peening with different temperatures from 300 °C to 600 °C. The results showed that the residual stresses were relaxed in the whole deformation layer especially under higher temperature. The maximum rates of stress relaxation took place at the initial stage of annealing process in all conditions. The relaxation process during isothermal annealing could be described by Zener-Wert-Avrami function. The thermal stability of residual stress in tempered 17-4PH was higher than that in laser hardened 17-4PH as well as that in α-iron, which was due to the pinning effects of ɛ-Cu precipitates on the dislocation movement. As massive ɛ-Cu precipitates formed in the temperature about 480 °C, the activation enthalpies for stress relaxation in laser hardened 17-4PH were the same as that in tempered 17-4PH in the conditions of isothermal annealing temperatures of 500 °C and 600 °C.

► Thermal relaxation investigation was carried out on tempered and laser hardened 17-4PH. ► The relaxation process of residual stress during isothermal annealing could be described by Zener-Wert-Avrami function. ► Because of the pinning effects of ɛ-Cu precipitates on the dislocations movements, the thermal stability of residual stresses in tempered 17-4PH was higher than that in laser hardened 17-4PH and that in α-iron.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 257, Issue 23, 15 September 2011, Pages 9830-9835
نویسندگان
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