کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5367370 1388365 2011 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
A different approach in sample preparation method for metallic contamination study by ToF-SIMS and TXRF
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
A different approach in sample preparation method for metallic contamination study by ToF-SIMS and TXRF
چکیده انگلیسی

We propose a methodology to realize reliable reference samples for ToF-SIMS quantitative analysis of metallic contaminants. The procedure consists of spinning a Co contaminated solution, for which the contaminant concentration has been previously determined by ICP-MS, on a clean Si-wafer with a thin surface oxide obtained by SC1 treatment. We have compared the ToF-SIMS results with TXRF and we have demonstrated the validity of the procedure. We have also evidenced the effects of sample aging on the measurements showing that contaminant migration towards the interface between oxide and silicon can significantly impact on the quantification correctness.


- We propose a method to realize reliable reference samples for ToF-SIMS quantitative analysis of metallic contaminants.
- We compare ToF-SIMS and TXRF results.
- We study the effects of sample aging.
- The contaminant migration towards the interface between oxide and silicon significantly impacts the quantification correctness.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 257, Issue 23, 15 September 2011, Pages 9925-9930
نویسندگان
, , ,