کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5367814 | 1388374 | 2011 | 7 صفحه PDF | دانلود رایگان |
(1 0 0) Si was dual ion-implanted with 24 keV N and 7 keV Pb to peak concentrations â¼10 at.%. Implanted samples were then electron beam annealed (EBA) at a peak temperature T for 30 s with T ranging from 100 °C to 900 °C and for 15 s at 1000 °C. Pb profiles were measured using RBS and surfaces characterised by AFM. For T up to 500 °C there was no shift in the profile from the implanted depth â¼10 nm. For higher values of T a striking feature was the large movement of the Pb profile away from the surface without a significant change in width or Pb content. The profile depths were: â¼40 nm for 600 °C, â¼68 nm for 700-900 °C and â¼80 nm for 1000 °C. The response to EBA was found to be strongly dependent on both ion implantation order and Si starting structure. For (1 0 0) Si nanowhiskers formed on the treated surfaces for T = 900 °C and 1000 °C. A model is developed based on the restructuring of the amorphous implanted layer under EBA. It is proposed that a compaction starting at the surface sweeps the Pb before it via a stress interaction as it advances into the Si.
Research highlightsⶠNovel movement of lead under electron beam annealing of silicon shallowly dual implanted with nitrogen and lead has been discovered. ⶠThe results are in stark contrast to those expected from conventional diffusion. ⶠThe lead atoms, retaining a narrow profile, are swept into the depth via stress interactions.
Journal: Applied Surface Science - Volume 257, Issue 11, 15 March 2011, Pages 4856-4862