کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5368129 1388385 2007 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Holographic lithography of a two-dimensional hexagonal structure: Effect of beam polarization
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Holographic lithography of a two-dimensional hexagonal structure: Effect of beam polarization
چکیده انگلیسی

A comparison is made between the theoretical determination of the interference contrast function with fabricated two-dimensional hexagonal structures of submicron lattice constant. Experiments were performed using a siloxane based hybrid organic-inorganic material and a holographic lithography method.Thin hybrid structured layers were fabricated and characterized for different conditions of beam polarizations between 0° and 90°. As a result, the photo patterning appears to be strongly dependent on beam polarization in accordance with theoretical predictions.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 254, Issue 4, 15 December 2007, Pages 850-854
نویسندگان
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