کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5369612 | 1388443 | 2007 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of boron concentration on the UV photosensitivity of silica glass film for planar lightwave circuit
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The photosensitivity dynamics in SiO2 glass with a composition similar to that of silica planar lightwave circuit (PLC) devices was investigated as a fundamental study prior to device fabrication. Silica bulk glasses with similar composition to the core layer of PLC devices were prepared with various concentrations of B2O3. The photosensitivity in boron and germanium co-doped amorphous SiO2 yields a refractive index change În as high as 10â3 after irradiation with a KrF UV laser beam. The index modulation disappeared after thermal annealing. The result of annealing experiment and UV absorption/Raman spectra revealed that the molar volume change by UV irradiation is responsible for the index variation in the material.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 253, Issue 19, 31 July 2007, Pages 8003-8007
Journal: Applied Surface Science - Volume 253, Issue 19, 31 July 2007, Pages 8003-8007
نویسندگان
Dongwook Shin,