کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5370117 1388475 2006 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Influence of negative ion element impurities on laser induced damage threshold of HfO2 thin film
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Influence of negative ion element impurities on laser induced damage threshold of HfO2 thin film
چکیده انگلیسی
Negative ion element impurities breakdown model in HfO2 thin film was reported in this paper. The content of negative ion elements were detected by glow discharge mass spectrum analysis (GDMS); HfO2 thin films were deposited by the electron-beam evaporation method. The weak absorption and laser induced damage threshold (LIDT) of HfO2 thin films were measured to testify the negative ion element impurity breakdown model. It was found that the LIDT would decrease and the absorption would increase with increasing the content of negative ion element. These results indicated that negative ion elements were harmful impurities and would speed up the damage of thin film.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 253, Issue 3, 30 November 2006, Pages 1111-1115
نویسندگان
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