کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5370176 1388475 2006 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Reactive sputtering: A method to modify the metallic ratio in the novel silver-copper oxides
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Reactive sputtering: A method to modify the metallic ratio in the novel silver-copper oxides
چکیده انگلیسی

Composite silver-copper targets were sputtered for the first time in various reactive Ar-O2 mixtures to deposit the novel silver-copper oxides on glass substrates. The effect of two deposition parameters (oxygen flow rate and target composition) on the films structure was investigated. Depending on these two deposition parameters, three types of silver-copper oxides were synthesised using the reactive sputtering process: AgxCu2−xO, AgxCu4−xO3 and Ag1−xCu1+xO2. Although conventional processes led to the formation of silver-copper oxides with stoichiometric Cu/Ag atomic ratio, it was demonstrated that the reactive sputtering process was suitable to modify this ratio in the deposited films. Finally, the optical and electrical properties of the silver-copper oxides were investigated and compared to that of copper oxides exhibiting similar structures.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 253, Issue 3, 30 November 2006, Pages 1484-1488
نویسندگان
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