کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5370314 | 1388483 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Performance enhancement of a heterojunction bipolar transistor (HBT) by two-step passivation
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موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
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چکیده انگلیسی
An interesting two-step passivation (with ledge structure and sulphide based chemical treatment) on base surface, for the first time, is demonstrated to study the temperature-dependent DC characteristics and noise performance of an InGaP/GaAs heterojunction bipolar transistor (HBT). Improved transistor behaviors on maximum current gain βmax, offset voltage ÎVCE, and emitter size effect are obtained by using the two-step passivation. Moreover, the device with the two-step passivation exhibits relatively temperature-independent and improved thermal stable performances as the temperature is increased. Therefore, the two-step passivationed device can be used for high-temperature and low-power electronics applications.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 252, Issue 22, 15 September 2006, Pages 7755-7759
Journal: Applied Surface Science - Volume 252, Issue 22, 15 September 2006, Pages 7755-7759
نویسندگان
Ssu-I. Fu, Po-Hsien Lai, Yan-Ying Tsai, Ching-Wen Hung, Chih-Hung Yen, Shiou-Ying Cheng, Wen-Chau Liu,