کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5377361 1504339 2006 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
A new simulation model for electrochemical metal deposition
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
A new simulation model for electrochemical metal deposition
چکیده انگلیسی
A new atomistic simulation model for electrochemical systems is presented. It combines microcanonical molecular dynamics for the electrode with stochastic dynamics for the solution, and allows the simulation of electrochemical deposition and dissolution for specific electrode potentials. As first applications the deposition of silver and platinum on Au(1 1 1) have been studied; both flat surfaces and surfaces with islands have been considered. The two systems behave quite differently: Ag on Au(1 1 1) grows layer by layer, while Pt forms a surface alloy on Au(1 1 1), which is followed by three-dimensional growth.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Chemical Physics - Volume 320, Issues 2–3, 5 January 2006, Pages 149-154
نویسندگان
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