کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5384883 1505012 2010 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Oxygen atom kinetics in silane-hydrogen-nitrous oxide mixtures behind reflected shock waves
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Oxygen atom kinetics in silane-hydrogen-nitrous oxide mixtures behind reflected shock waves
چکیده انگلیسی
► Silane is widely used as a silicon source for material synthesis and is a potential fuel additive. ► Silane handling is very hazardous and there is a lack of data concerning its oxidation process notably by N2O. ► New experimental results for the SiH4-H2-N2O-Ar mixtures have been obtained using oxygen Atomic Resonance Absorption Spectroscopy coupled with the shock-tube technique. ► Results have been interpreted using a detailed kinetic scheme. Sensitivity and reaction pathway analysis have demonstrated that the kinetic of O atoms is dominated by the N2O (+M) = N2 + O (+M) and O + H2 = OH + H reactions. The implication of the Si + N2O = Products reactions has been also demonstrated.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Chemical Physics Letters - Volume 500, Issues 4–6, 19 November 2010, Pages 223-228
نویسندگان
, , ,