The interfacial electronic structure of fullerene/ultra thin dielectrics of SiO2 and SiON

► The electronic structures of C60/SiO2 and C60/SiON and energy diagrams are described. ► The surface nitrogen reduces the work function of the SiON compared to the SiO2. ► The LUMO offset is determined by the work function of each dielectric substrate. ► The threshold voltage is related to the work function of the dielectric layer used.