Morphology of perylene thin films on SiOx/Si(1Â 0Â 0) and SiO2/Si(1Â 0Â 0): A spectroscopic and microscopic study of the influence of the preparation parameters

Ten square micron AFM images of 120 nm-thick perylene films on SiOx/Si(1 0 0), grown at Tsub = 300 K and a deposition rate of 11.6 nm/min. The grey scale corresponds to the first derivative to better represent the grain structure. The z-axis is expanded in comparison to the x- and y-axes. It is clearly visible that the grain size is relevantly larger in comparison with the preparation at lower temperature and lower deposition rates and the film growth shows a different behavior.