Enhanced nucleation, smoothness and conformality of ultrananocrystalline diamond (UNCD) ultrathin films via tungsten interlayers

Extremely smooth, thin, and continuous ultrananocrystalline diamond films were synthesized by microwave plasma chemical vapor deposition using a 10 nm tungsten (W) interlayer between the silicon substrate and the diamond film. The W interlayer significantly increased the initial diamond nucleation density, thereby lowering the surface roughness and eliminating interfacial voids.