Redox behavior of a ferrocene monolayer on SiO2 obtained after click-coupling

► A click-chemistry reaction is used to anchor ethynyl-ferrocene on SiO2 layer. ► Triazole ring terminated C3 linker has never been tested before on SiO2. ► Thin SiO2 layer along with a short alkyl chain linker produces a dielectric barrier. ► This hybrid molecular/Si system is promising in memory device applications. ► Redox charge/discharge kinetics is studied by means of cyclic voltammetry.