Anisotropic growth of titanium disilicide nanocrystals on Si(113) surface

► Microscopic images of Ti-deposited Si(113) surfaces are presented at the atomic scale. ► The anisotropic growth of silicide particles is specific to the Si(113) surface. ► The growth mechanism on this surface is different from (001) and (111) surfaces. ► Lattice mismatch between TiSi2 and the reconstructed surface structure is crucial. ► The findings present usefulness of high-index surfaces for fabrication on silicon.