Interfacial interaction between cerium oxide and silicon surfaces

► A subnanometric silicate phase forms at the interface between cerium oxide and Si. ► The silicate phase evolves in thickness and composition after thermal treatments. ► The interfacial reaction has the same extent on the (111) and (100) Si surfaces. ► The interfacial reaction is partially limited by the presence of a silicon oxide. ► The silicate phase is stable towards oxidizing treatments.