Oxidation of ultra-thin Ti films on Mo(100): Soft X-ray photoelectron spectroscopy study

► The Ti oxide films were formed on Mo(100). ► The Ti atoms in the film were in a 2+ state after heating at 1100-1500 °C. ► The film-covered surface after heating at 1300 °C for 10 s gives a (2 × 2) LEED pattern. ► The film with a (1 × 1) periodicity is existent in the (2 × 2) system.