کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5424172 | 1395816 | 2008 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Thermally induced reaction and diffusion of carbon films on Ni(1Â 1Â 1) and Ni(1Â 0Â 0)
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
Thin carbon films on Ni(1Â 1Â 1) and Ni(1Â 0Â 0) and the reactive and diffusive interactions between film and substrate are investigated using X-ray photoelectron spectroscopy (XPS). The carbon films are deposited from the vapor phase with the substrates at room temperature. After deposition the films contain mainly elemental carbon. Restricted only to the carbon-nickel interface carbidic carbon is observed. Carbon films of various thicknesses between 0.4 and 3.2Â nm are investigated after thermal treatments up to 970Â K. The C 1s signal intensities are used for chemical analysis, both in a qualitative and quantitative way. The initially formed carbide partially decomposes between 400 and 570Â K. Additional carbide formation sets in again, combined with incipient carbon diffusion, at higher temperatures. Carbon diffusion into the bulk leads to a decreasing C 1s signal intensity until the carbon is almost completely lost into the bulk.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface Science - Volume 602, Issue 23, 1 December 2008, Pages 3623-3631
Journal: Surface Science - Volume 602, Issue 23, 1 December 2008, Pages 3623-3631
نویسندگان
A. Wiltner, Ch. Linsmeier,