Structure of the oxidized 4H-SiC(0 0 0 1)-3 × 3 surface

We have determined the structure of the 4H-SiC(0 0 0 1)-3 × 3 surface after exposure to small amounts of molecular oxygen at room temperature using surface X-ray diffraction. The 3 × 3 reconstruction remains until at least an exposure of 10,000 L, but the diffracted intensities change, indicating structural changes. Comparison of the Patterson maps of the clean and oxidized surface shows that the main changes occur at the Si tetramer on top of the 3 × 3 surface. Atomic positions for several models were fitted to the experimental data. A model in which oxygen atoms are inserted into the Si tetramer gives the best fit to the experimental data. The best-fit atomic positions agree well with those obtained using density functional calculations.