Impact of 100 MeV Au on the surface of relaxed Si0.5Ge0.5 alloy films studied by atomic force microscopy

We demonstrate a gradual surface modification process of relaxed Si0.5Ge0.5 alloy films by 100 MeV Au beam with fluence varying between 5 × 1010 and 1 × 1012 ions/cm2 at 80 K by means of atomic force microscopy (AFM). Presence of Ge quantum dots (QDs) was found in the virgin sample. The disappearance of the QDs were noticed when the samples were irradiated with a fluence of 5 × 1010 ions/cm2. Craters were found developing at a fluence of 1 × 1011 ions/cm2. Apart from the evolution of the craters, blisters were also detected at a fluence of 1 × 1012 ions/cm2. Variation of the average root mean square value of the surface roughness as a function of fluence was examined.