کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5426420 1395889 2006 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Self-organized dot patterns on Si surfaces during noble gas ion beam erosion
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Self-organized dot patterns on Si surfaces during noble gas ion beam erosion
چکیده انگلیسی

The erosion of target materials with energetic ions can lead to the formation of patterns on the surface. During low-energy (⩽2000 eV) noble gas (Ne+, Ar+, Kr+, Xe+) ion beam erosion of silicon surfaces dot patterns evolve on the surface. Dot structures form at oblique ion incidence of 75° with respect to surface normal, with simultaneous sample rotation, at room temperature. The lateral ordering of dots increases while the dot size remains constant with ion fluence, leading to very well ordered dot patterns for prolonged sputtering. Depending on ion beam parameters, dot nanostructures have a mean size from 25 nm up to 50 nm, and a mean height up to 15 nm. The formation of dot patterns depends on the ion/target mass ratio and on the ion energy. The temporal evolution and the lateral ordering of these nanostructures is studied using scanning force microscopy (AFM).

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface Science - Volume 600, Issue 18, 15 September 2006, Pages 3757-3761
نویسندگان
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