Structural and surface analysis of thin-film ZnTe formed with pulsed-laser deposition

Nanosecond pulses of a Nd:YAG laser have been employed to deposit thin-film zinc telluride (ZnTe) on silicon (Si) and glass without heating these substrates. We present and discuss the structural and surface properties of films deposited at 1064 nm and 532 nm. X-ray diffraction and analysis of the surface roughness with atomic force microscopy reveal that the material texture and surface morphology depend on the ablation laser line used rather than on the substrate. The observations contribute to improved understanding of pulsed-laser deposition and provide tools to optimize the optoelectronic and photonic properties of ZnTe thin-films as well as their incorporation into Si-based technologies in order to fabricate cost-effective and functional optoelectronic devices and all-optical laser digitizer.