کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5442608 | 1510765 | 2017 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Analysis of the properties of functional titanium dioxide thin films deposited by pulsed DC magnetron sputtering with various O2:Ar ratios
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
For the purpose of thin film preparation, pulsed DC magnetron sputtering process was performed and various O2:Ar gas ratios were applied during deposition. Structural properties of thin films deposited with various sputtering atmospheres were determined based on the results of the x-ray diffraction method and Raman spectroscopy, which revealed that all coatings were nanocrystalline and had anatase or rutile structure. The surface morphology of the coatings were investigated with the aid of a scanning electron microscopy and atomic force microscopy. Surface properties were evaluated by x-ray photoelectron spectroscopy and wettability measurements. It was revealed that an increase of Ar amount in the sputtering gas atmosphere caused as a result an increase of thin film water contact angle and enhanced ability of the surface to adsorb water molecules and hydroxyl radicals. Optical properties evaluated on the basis of transmission and reflection measurements showed that all coatings were transparent in the visible wavelength range, but had different refractive index, porosity and packing density. The mechanical properties of the obtained coatings were determined on the basis of nanoindentation tests. Prepared TiO2 thin films had different surface, optical and mechanical properties depending on the gas atmosphere during deposition.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optical Materials - Volume 69, July 2017, Pages 96-104
Journal: Optical Materials - Volume 69, July 2017, Pages 96-104
نویسندگان
Michal Mazur,