Reduction of residual stress in AlN thin films synthesized by magnetron sputtering technique

Reduction of residual stress in AlN thin films synthesized by magnetron sputtering technique

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Chemistry and Physics - Volume 200, 1 October 2017, Pages 78-84

Padmalochan Panda, R. Ramaseshan, N. Ravi, G. Mangamma, Feby Jose, S. Dash, K. Suzuki, H. Suematsu,