کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
545213 1450553 2010 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Nanoscale thermally induced stress analysis by complementary Scanning Thermal Microscopy techniques
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Nanoscale thermally induced stress analysis by complementary Scanning Thermal Microscopy techniques
چکیده انگلیسی

Thermally induced stress is determined using boundary values obtained by complementary Scanning Joule Expansion Microscopy and Scanning Thermal Microscopy. The stress function is then solved with the Finite Element Method. Surface stress analysis as well as stress analysis of multilayered structures are performed in order to demonstrate the application of the developed measurement technique to reliability investigations.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 50, Issues 9–11, September–November 2010, Pages 1459–1463
نویسندگان
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