کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5457986 | 1515954 | 2017 | 35 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Electrochemical behavior assessment of tantalum in aqueous KOH solutions
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
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چکیده انگلیسی
The current work aims at studying passive and electrochemical behavior of tantalum in KOH solutions of varied concentrations ranging from 0.01 to 1Â M using various electrochemical methods. Electrochemical impedance spectroscopy (EIS) results show that the passive film formed on tantalum loses its protectiveness upon addition of KOH concentration. Indeed, the passivity undergoes a drastic change moving toward higher KOH concentrations. The semiconductive behavior of the passive films formed on tantalum is also investigated by employing Mott-Schottky analysis in conjunction with point defect model (PDM). Although semiconducting behavior remains the same as n-type, KOH concentration greatly affects the levels of donor densities. Moreover, Mott-Schottky analysis showed that flat band potential is quite sensitive to KOH concentration.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: International Journal of Refractory Metals and Hard Materials - Volume 64, April 2017, Pages 168-175
Journal: International Journal of Refractory Metals and Hard Materials - Volume 64, April 2017, Pages 168-175
نویسندگان
Arash Fattah-Alhosseini, Farid Reza Attarzadeh, Saeed Vafaeian, Meysam Haghshenas, Mohsen K. Keshavarz,