کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
545990 | 1450559 | 2007 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Peculiarities of electron tunnel injection to the drain of EEPROMs
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
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چکیده انگلیسی
A specific time-resolved dynamic current measurement procedure is used to characterize high-field electron tunnel injection to the drain of EEPROMs. This allows the direct observation of a transient regime eventually occurring in the case of moderately doped drain. Another peculiarity is also evidenced, namely a stationary regime where measured current is far higher than anticipated by simulation. This is attributed to a non-equilibrium charge versus band-bending in the drain which is controlled by electron–hole pairs subsequent to impact ionization of electrons tunnelling from the gate.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 47, Issues 4–5, April–May 2007, Pages 631–634
Journal: Microelectronics Reliability - Volume 47, Issues 4–5, April–May 2007, Pages 631–634
نویسندگان
N. Baboux, C. Busseret, C. Plossu, P. Boivin,