Ferroelectric characteristic of group IV elements added SrBi2Ta2O9 thin films

The SrBi2Ta2O9 (SBT) thin film added IV group elements was fabricated on the Pt/Ti/SiO2/Si substrate by the metal–organic decomposition (MOD) method, the Pt electrode was deposited on the SBT thin film by the DC spattering method. The electric properties of the ferroelectric capacitor were measured. The remanent polarization and the relative dielectric constant of the SBT thin film have decreased, according to the amount of IV group elements addition. The IV group elements added SBT thin film with low relative dielectric constant and low remanent polarization is suitable for the application of the ferroelectric gate FET type memory.