کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5467898 | 1518628 | 2017 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
High aspect ratio channels in glass and porous silicon
ترجمه فارسی عنوان
کانال های نسبتا بالا در سیلیکون شیشه ای و متخلخل
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کلمات کلیدی
اشعه پرتو پروتون، کانال نسبت کانون نسبتا بالا سیلیکون متخلخل،
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
چکیده انگلیسی
We have developed a micromachining process to produce high-aspect-ratio channels and holes in glass and porous silicon. Our process utilizes MeV proton beam irradiation of silicon using direct writing with a focused beam, followed by electrochemical etching. To increase throughput we have also developed another process for large area ion irradiation based on a radiation-resistant gold surface mask, allowing many square inches to be patterned. We present a study of the achievable channel width, depth and period and sidewall verticality for a range of channels which can be over 100 μm deep or 100 nm wide with aspect ratios up to 80. This process overcomes the difficulty of machining glass on a micro- and nanometer scale which has limited many areas of applications in different fields such as microelectronics and microfluidics.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 394, 1 March 2017, Pages 1-5
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 394, 1 March 2017, Pages 1-5
نویسندگان
H.D. Liang, Z.Y. Dang, J.F. Wu, J.A. van Kan, S. Qureshi, M.D. Ynsa, V. Torres-Costa, A. Maira, T.V. Venkatesan, M.B.H. Breese,