Effect of material of the crucible on operation of magnetron sputtering system with liquid-phase target

The paper presents a high-rate method for metal coating deposition by the means of magnetron sputtering system (MSS) with liquid-phase target. Maximum copper deposition rate at a power density of 55 W/cm2 is 200 nm/s, which is twenty times higher than if an ordinary magnetron is used. The effect of material of the crucible on operation of MSS with liquid-phase target and copper coating deposition rate is studied. It is demonstrated that using the crucible with a lower emissivity allows the several-fold increase in deposition rate.